The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 1992
Filed:
Feb. 03, 1989
Aron M Rosenfeld, Ontario, CA;
Paul Smits, Ontario, CA;
Alcan International Limited, Montreal, CA;
Abstract
A process for producing a released film made of at least two layers, one or more of which has been formed by a vapor deposition technique. The process involves anodizing a metal substrate comprising a valve metal or valve metal alloy to form an anodic oxide layer on the substrate, the anodization being carried out in the presence of an adhesion-reducing agent (e.g. fluoride) which makes the anodic layer detachable from the valve metal, coating the anodic layer with one or more layers of desired materials by a vapor deposition technique (e.g. sputtering or vacuum evaporation, etc.) to form a film of desired structure which is releasable from the metal substrate, and then detaching the releasable film from the metal substrate. The film can, if desired, be transferred to another substrate by attaching the other substrate to the releasable film before the releasable film is detached from the metal substrate. The process makes it possible to provide free-standing vapor deposited films or heat-sensitive (or other) substrates coated with such films.