The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 1992
Filed:
May. 20, 1991
Applicant:
Inventors:
Toru Suga, Tokyo, JP;
Kazuhiko Inoue, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ; H01L / ;
U.S. Cl.
CPC ...
357 63 ; 357 64 ; 357 22 ; 357 232 ;
Abstract
In a semiconductor device constituting a GaAs MESFET, a GaAs substrate is prepared from a base material containing boron and carbon ions as impurities having a total impurity concentration of 2.times.10.sup.17 atoms/cm.sup.3 or more. Electrode layers are formed at predetermined portions on the GaAs substrate, and an active layer is formed to be adjacent to the electrode layers by ion implantation. Source and drain electrodes are formed on the electrode layers, respectively, and a gate electrode is formed on the active layer.