The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 1992
Filed:
Feb. 07, 1991
Friedrich Bobel, Uttenreuth, DE;
Norbert Bauer, Erlangen, DE;
Fraunhofer Gesellschaft Zur Forderung der angewandt, Munich, DE;
Abstract
A semiconductor production control and measuring unit for a two-dimensional detection and control of concentration and pressure distribution of process particles within a process chamber, which forms part of a semiconductor production device and in the interior of which a vacuum can be generated with the aid of a vacuum pump. A light fan source produces a substantially parallel light fan within the process chamber, the light fan penetrating the area of the process chamber which is to be examined with regard to concentration distribution or pressure distribution, the wavelength of the light emitted by the light fan source being so short that the process particle have imparted thereto an excitation energy sufficient for fluorescent radiation. A camera is disposed at an angle with respect to the light fan and it covers the area to be examined. In the spectral region of the fluorescent radiation of the process particles, the camera has a quantum efficiency which detects the fluorescent radiation. A processing device is connected to the camera and determines the two-dimensional concentration and pressure distribution of the process particles on the basis of the image signals received from the camera.