The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 1992
Filed:
Oct. 18, 1990
Katsumi Kawahara, Osaka, JP;
Masami Uchida, Osaka, JP;
Kazumi Yoshioka, Kyoto, JP;
Takeo Ohta, Nara, JP;
Keiichiro Horai, Osaka, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
A method of depositing the layers of an optical recording medium to their requisite thicknesses is disclosed in which optical monitoring of the reflectivity of a first dielectric layer during deposition is used to determine the deposition rate. The reflectivity is monitored to determine the time period in which the reflectivity reaches a maximum or minimum value, which occurs when the layer is a quarter wave thick. The deposition rate is derived from that time period, and the deposition is continued for a time in accordance with the deposition rate until the requisite thickness of the first dielectric layer is obtained. The second dielectric layer is deposited for a lesser time period in accordance with the deposition rate which has been optically derived during deposition of the first dielectric layer.