The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 1992
Filed:
Jul. 30, 1990
Paul C Badavas, Southboro, MA (US);
The Foxboro Company, Foxboro, MA (US);
Abstract
A statistical process control system provides asymmetrical nonlinear automatic closed-loop feedback control. The system has application, for example, in the control of equipment that responds to a controlled variable signal to vary a measurable characteristic of a process. The system uses an accumulated deviation of a measured subgroup means minus a target value, divided by the subgroup standard deviation, to modify the manipulated variable each time the accumulated value exceeds a decision interval above or below the target. The system permits the use of independent slack variables subtracted from the accumulated deviation to more closely model the underlying process. Likewise, the system permits the use of independent alarm values and variable gains to permit greater control of the process.