The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 1992
Filed:
Jan. 28, 1991
Kazuhito Isobe, Kawasaki, JP;
Reiji Hirano, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An alignment and exposure method usable in manufacture of semiconductor devices, for aligning a mask and a wafer and for exposing the wafer to the mask to print a pattern of the mask on a photoresist of the wafer, is disclosed. The method includes illuminating an alignment mark of the wafer with first illumination light having a center wavelength at a first wavelength and second illumination light having a center wavelength at a second wavelength; adjusting the proportion of the first illumination light and the second illumination light; photoelectrically detecting the alignment mark of the wafer and adjusting the relative position of the wafer to the mask on the basis of a detection signal formed as a result of the photoelectric detection; and exposing the wafer to the mask with exposure light.