The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 1992
Filed:
Jan. 11, 1991
Richard H Ahlert, San Jose, CA (US);
James K Howard, Morgan Hill, CA (US);
Steven E Lambert, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
In the fabrication of thi film cobalt alloy magnetic recording disks by sputter-deposition, the coercivity of the disks can be selectively varied by introducing a predetermined amount of hydrocarbon gas, such as methane, into the argon-based sputtering atmosphere. The flow rate of the hydrocarbon gas into the sputtering chamber is directly related to the coercivity of the resulting disks. This permits the coercivity of the disks to be controlled without the necessity of changing the composition of the cobalt alloy sputtering targets, and without the necessity of changing the thickness of an underlying between the disk substrate and the magnetic layer. The use of hydrocarbon gas in the reactive sputtering of the cobalt alloy magnetic layer in the disks does not affect the intrinsic media noise of the disks, thus allowing for the manufacturing of disks with high signal-to-noise ratio (SNR) of the readback signal.