The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 1992
Filed:
Nov. 09, 1989
Omron Tateisi Electronics Co., Kyoto, JP;
Abstract
An electron-beam resist is applied over a substrate so as to have a thickness larger than the maximum thickness of a micro aspherical lens to be fabricated, a predetermined pattern is written on this resist by electron-beam lithography and then, the resist is developed, thereby to fabricate a micro aspherical lens or the prototype thereof. Consequently, a micro aspherical lens causing little on-axis aberration and chromatic aberration and having a diameter of 1 millimeter or less can be achieved with high precision. In addition, the micro aspherical lens can be produced in large quantity because the reproduction thereof is relatively easy. Furthermore, an optical fiber coupling device, a focusing optical system, an optical device, a semiconductor laser light source, an image device or the like can be constructed using the micro aspherical lens thus fabricated. Finally, a micro lens array constructed by arranging converging lenses having a diameter of approximately several to several hundred micrometers in a two-dimensional manner is used and this micro lens array is arranged ahead of a light source, thereby forming a multi-beam spot caused by diffraction in a distant position. A three-dimensional shape can be recognized with high precision by shape recognition means utilizing this multi-beam spot.