The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 1992
Filed:
Sep. 22, 1989
Werner Rutsch, Fribourg, CH;
Rudolf Kirchmayr, Aesch, CH;
Rinaldo Husler, Basel, CH;
Kurt Dietliker, Fribourg, CH;
Ciba-Geigy Corporation, Ardsley, NY (US);
Abstract
Propiophenones of the formula I ##STR1## in which R.sup.1 is hydrogen or C.sub.1 -C.sub.4 -alkyl, --Si(CH.sub.3).sub.3, allyl or benzyl, R.sup.2 is hydrogen, C.sub.1 -C.sub.8 -alkyl, C.sub.1 -C.sub.4 -alkyl which is substituted by C.sub.1 -C.sub.4 -alkoxy or --OH, --(CH.sub.2 --CH.sub.2 --O).sub.n --R.sup.5 where n is 2 to 20 and R.sup.5 is H or C.sub.1 -C.sub.4 -alkyl, --Si(CH.sub.3).sub.3, benzyl, C.sub.3 -C.sub.6 -alkenyl, C.sub.3 -C.sub.4 -alkynyl or 2-tetrahydrofuranyl, or R.sup.1 and R.sup.2 together are a C.sub.1 -C.sub.6 -alkylidene radical or a C.sub.2 -C.sub.6 -alkylidene radical which is substituted by hydroxyl, C.sub.1 -C.sub.4 -alkoxy or phenyl, a linear or branched C.sub.2 -C.sub.6 -alkanediyl radical, a benzylidene, cyclopentylidene or cyclohexylidene radical or a 2,2,2-trichloroethylidene, 2-furylmethylidene or dimethylsilylidene radical, R.sup.3 is phenyl which is unsubstituted or substituted by one or more --Cl, C.sub.1 -C.sub.4 -alkyl, C.sub.1 -C.sub.4 -alkoxy or C.sub.1 -C.sub.4 -alkylthio radicals, and is also benzoylphenyl, phenoxyphenol or phenylthiophenyl, R.sup.4 is C.sub.1 -C.sub.4 -alkyl, or phenyl which is unsubstituted or substituted by one or more --Cl, C.sub.1 -C.sub.4 -alkyl or C.sub.1 -C.sub.4 -alkoxy radicals, and R.sup.5 is hydrogen or C.sub.1 -C.sub.4 -alkyl, or R.sup.4 and R.sup.5 together are a trimethylene or tetramethylene radical, and R.sup.6 is hydrogen, C.sub.1 -C.sub.4 -alkyl, --CCl.sub.3 or phenyl, subject to the condition that, if R.sup.2, R.sup.5 and R.sup.6 at the same time are hydrogen and R.sup.3 and R.sup.4 are at the same time phenyl, R.sup.1 must not be hydrogen or C.sub.1 -C.sub.4 -alkyl, also, if R.sup.3 and R.sup.4 at the same time are phenyl and R.sup.5 and R.sup.6 are at the same time hydrogen, R.sup.1 and R.sup.2 together must not be alkylidene or benzylidene, and also, if R.sup.3 and R.sup.4 at the same time are p-methoxyphenyl and R.sup.2, R.sup.5 and R.sup.6 are at the same time hydrogen, R.sup.1 must not be hydrogen, and, finally, if R.sup.2 and R.sup.6 at the same time are hydrogen and R.sup.3, R.sup.4 and R.sup.5 are at the same time phenyl, R.sup.1 must not be hydrogen, are valuable initiators for the photopolymerization of ethylenically unsaturated compounds.