The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 1992
Filed:
Feb. 22, 1991
Hiroshi Igarashi, Nishinomiya, JP;
Osamu Terao, Taishibashi, JP;
Nobuhide Tsutsumi, Neyagawa, JP;
Yukio Yamamoto, Neyagawa, JP;
Dai Nippon Toryo Co., Ltd., Osaka, JP;
Dai Nippon Insatsu Kabushiki Kaisha, Tokyo, JP;
Abstract
A method for forming a coating film with a relief pattern, which comprises coating an undercoating material on a substrate surface to form a cured undercoating film, coating an intermediate coating material partly on the undercoating film in a desired pattern, drying it to such an extent that the amount of the solvent in the formed intermediate coating film is within a range of from 1 to 50% by weight, then overcoating a top coating material comprising, as binders, a polyester resin and an aminoplast resin cross-linking agent having a surface tension of at least 40 dyn/cm over the entire surface, followed by baking and curing to form a top coating film with the relief pattern.