The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 1992
Filed:
Jun. 25, 1991
Applicant:
Inventors:
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ; B01J / ;
U.S. Cl.
CPC ...
378 35 ; 156D / ; 423446 ; 427249 ;
Abstract
A substantially compressive stress-free, pin-holes free, and defects free continuous polycrystalline diamond membrane for an x-ray lithography mask is produced by placing a prepared substrate into a hot filament chemical vapor deposition reaction chamber, pre-heating the substrate to 400.degree. C.-650.degree. C. in the presence of an inert gas, heating the substrate to 650.degree. C.-700.degree. C. in the presence of hydrogen and carbon compounds, and chemically vapor depositing a polycrystalline diamond membrane onto the substrate.