The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 1992
Filed:
Jun. 26, 1990
Itsuo Takanashi, Kamakura, JP;
Shintaro Nakagaki, Fujisawa, JP;
Tsutou Asakura, Yokohama, JP;
Masato Furuya, Yokosuka, JP;
Tetsuji Suzuki, Yokosuka, JP;
Hirohiko Shinonaga, Yokohama, JP;
Victor Company of Japan, Ltd., Yokohama, JP;
Abstract
An electromagnetic radiation beam scanning system for scanning an object with an electromagnetic radiation beam. The scanning system comprises first and second beam-narrowing devices which are arranged so as to have elongated light-transmission regions, respectively, and which are overlapped each other so that the light-transmission regions intersect each other. Each of the beam-narrowing devices includes a light modulation layer showing an electro-optic effect, first and second electrodes disposed so as to sandwich the light modulation layer, first and second polarizers disposed so as to sandwich the light modulation layer and a power source for applying voltages to the first and second electrodes. The light modulation layer combined with the polarizers forms the elongated light-transmission region in response to application of the voltages to the first and second electrodes due to the power source so as to produce a narrowed beam when a light beam is incident thereon. The position of each of the light-transmission regions in each of the first and second beam-narrowing devices is arranged to be movable in response to variation of at least one of the application voltages due to the power source.