The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 1992
Filed:
Aug. 16, 1989
Applicant:
Inventors:
Mordechai Rothschild, Newton, MA (US);
Daniel J Ehrlich, Lexington, MA (US);
Jerry G Black, Lincoln, MA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ; B05D / ;
U.S. Cl.
CPC ...
505-1 ; 505730 ; 505732 ; 505742 ; 505701 ; 427 531 ; 427 62 ; 427 63 ; 428702 ; 428930 ;
Abstract
A method is disclosed for forming a patterned oxide superconducting film wherein a selected region of a ternary metal oxide superconducting film is irradiated in a controlled atmosphere with photons so as to become non-superconductive.
Rothschild, Mordechai. (1992). Formation and high resolution patterning of superconductors (U.S. Patent No. 5143894). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5143894
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile