The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 1992
Filed:
Apr. 23, 1991
Douglas B Meakin, Harrow-on-the-Hill, GB;
Abstract
An apparatus for depositing a thin film of amorphous or polycrystalline silicon on substrates by a low-pressure chemical vapor deposition process includes a high-speed pump device connected to one end of a vapor deposition chamber and operative to maintain in the vapor deposition chamber a pressure at or below 20 milliTorr, an inlet adjacent the other end of the chamber for introducing gas into the chamber such that the gas flows from the gas inlet toward the pump device, and a substrate support within the vapor deposition chamber for orientating the major faces of the substrates substantially perpendicularly to the gas flow direction, wherein the combined conductance of the vapor deposition chamber, substrate support, and substrates is at least ten times the conductance of the pump device.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile