The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 1992
Filed:
Apr. 26, 1991
Rex L Schlicher, Lorton, VA (US);
Steven M Rinaldi, E-401 APO New York, NY (US);
David J Hall, Pittsburgh, PA (US);
Peter M Ranon, San Pedro, CA (US);
Charles E Davis, Albuquerque, NM (US);
Other;
Abstract
An electromagnetic propulsion system based on an extremely low frequency (elf) radiating antenna structure driven by a matched high current pulsed power supply is described. The elf antenna structure resembles a modified three dimensional multiple-turn loop antenna whose geometry is optimized for the production of reaction thrust rather than the radiation of electromagnetic energy into space. The antenna structure is current driven rather than voltage drive. Rigid three dimensional geometric asymmetry, made up of flat electrical conductors that form a partially closed volume in the loop antenna structure, trap magnetic flux thereby causing a magnetic field density gradient along a single axis. This magnetic field density gradient then causes an imbalance in the magneto- mechanical forces that normally result from the interactions of the loop antenna's internal magnetic field with the current in the conductors of the loop antenna structure, as described by the Lorentz Force Law. The pulsed power supply is designed to provide the proper waveform to the antenna structure at an impedance matching the load impedance of the antenna. The rise time and shape of the input current waveform is crucial to maximizing the production of reaction thrust. Input voltage is at a nominal value sufficient to allow the desired high input current.