The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 1992

Filed:

Jul. 20, 1990
Applicant:
Inventors:

Rene Bisaro, Saint Maur des Fosses, FR;

Alain Friederich, Paris, FR;

Assignee:

Thomson-CSF, Puteaux, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437132 ; 156610 ; 437 24 ; 437 81 ; 437 82 ; 437108 ; 437133 ; 437173 ; 437247 ; 437931 ; 437934 ;
Abstract

A method for the manufacturing, by epitaxy, of monocrystalline layers of materials with different lattice parameters that includes:


Find Patent Forward Citations

Bisaro, Rene. (1992). Method for the manufacture, by epitaxy, of monocrystalline layers of (U.S. Patent No. 5141894). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5141894

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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