The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 1992
Filed:
May. 30, 1990
Atul Goel, Ft. Collins, CO (US);
Hewlett-Packard Company, Palo Alto, CA (US);
Abstract
The disclosed photoresist process employs an i-line peak containing light source, such as that of the mercury spectrum, in conjunction with a dye capable of both absorbing i-line light and withstanding subsequent those baking procedures employed in producing portable-conforming-mask (PCM) photoetchings. Applicant has found that a series of butadiene or bromine substituted butadiene dyes in general, and N,N'-Dibutyl-N,N'-Di (1-(4,4-dicyano-1,3-butadiene))-1,6-hexanediamine, in particular, are particularly well suited to these purposes. Such dyes are most preferably used in conjunction with a second dye capable of absorbing of a non-i-line light source used to expose a bottom photoresist layer of a PCM system.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile