The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 1992
Filed:
Dec. 14, 1990
Eugene F Duncan, Wauwatosa, WI (US);
Eaton Corporation, Cleveland, OH (US);
Abstract
A shutter is manually rotated across a circular aperture and into a light beam projecting through said aperture to selectively block a predetermined proportion of the light beam, thereby reducing intensity of light emitted to shorten the target sensing region distance for a photoelectric proximity sensor. First and second edges of the shutter intersect at a corner common to both edges and greater than ninety degrees. The shutter pivot is located so the corner traverses the aperture and thus the light beam substantially diametrically to cause the first edge to progressively reduce the light beam, the second edge sequentially progressively reducing the remaining half-circle of light beam upon continued rotation of the shutter.