The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 1992
Filed:
Aug. 13, 1990
Norbert Conrads, Hauset, BE;
Walter Hillen, Aachen-Walheim, DE;
U.S. Philips Corporation, New York, NY (US);
Abstract
At least one primary diaphragm comprises two elements displaceable so as to form a linear fan-shaped beam which is incident on an object to be examined. The elements form the slit-shaped aperture forming the fan beam in their normal X-ray beam forming position and are moveable to a respective, selectable limit position perpendicularly to the fan shaped beam in order to define and mark an examination zone greater in cross-section area than the fan beam with a light beam. Light incident on the examination zone is restricted by the diaphragm elements in their limit positions, thus marking the examination zone with the light beam. X-ray exposure of the object to be examined takes place only when the elements are between the two positions defining the examination zone of the primary diaphragm where its diaphragm elements occupy in their respective limit positions.