The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 1992
Filed:
Mar. 29, 1991
Applicant:
Inventor:
Jiro Ikeda, Shizuoka, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20429825 ; 20429835 ; 118719 ; 118729 ; 118730 ; 118731 ; 414217 ; 414222 ; 414225 ;
Abstract
The sputtering apparatus for the present invention is used for manufacturing optical discs. On loading and unloading of disc substrates to and from a vacuum chamber, a disc entrance and exit opening provided on the vacuum chamber is closed by a tray having an opening at the center thereof on which the disc substrate is placed and a push up rod having a closing side closing the opening of the tray on the lower side thereof. Sealing of the disc entrance and exit opening may be made positive and the vacuum chamber is uniformly evacuated so that an excellent sputtering can be performed.