The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 1992
Filed:
Oct. 11, 1990
Yasuhisa Ohtake, Fukaya, JP;
Yasushi Magaki, Fukaya, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
An aperture pattern-printing plate used for manufacturing a shadow mask, which comprises a transparent substrate, and an emulsion layer which is formed on the transparent substrate and which is opaque at portions corresponding to apertures of the shadow mask and transparent at other portions, wherein the emulsion layer is overlaid with at least one of the following a substantially-amorphous, transparent scratch-preventing film obtained by hydrolysis and condensation of metal alcoholate and having a thickness of not more than 1.5 .mu.m, and a foreign matter-preventing film formed substantially of silicone and having a thickness of not more than 0.5 .mu.m. The foreign matter-preventing film is formed on the scratch-preventing film if the foreign matter-preventing film and scratch-preventing film are both formed.