The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 1992
Filed:
Mar. 26, 1991
Harold M Epstein, Columbus, OH (US);
Allan H Clauer, Worthington, MI (US);
Boyd A Mueller, Columbus, MI (US);
Jeffrey L Dulaney, Hilliard, OH (US);
Bernerd E Campbell, Upper Arlington, OH (US);
Craig T Walters, Columbus, OH (US);
Battelle Memorial Institute, Columbus, OH (US);
Abstract
Methods and apparatus for improving properties of a solid material in a target (11) by providing shock waves therein. There are directed to the surface of the material (11) pulses of coherent radiation (12) having average energy fluence of at least about 10 Joules per square centimeter and rise time of not longer than about 5 nanoseconds within a fluorescence envelope lasting about 0.5 to 5 milliseconds, at a rate of about 1 radiation pulse per 100 to 200 microseconds. The leading edge of each pulse (12) is sharpened by providing in its path an aluminum film (18) about 150 to 5000 angstroms thick that is vaporized by the pulse and then is moved across the path so that a later pulse (12) strikes an area of the film (18) not already vaporized by an earlier pulse (12). The radiation (12) is amplified by an amplifier (23) comprising a rod of phosphate laser glass that was strengthened by an ion exchange process.