The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 1992
Filed:
Feb. 12, 1990
Wright State University, Dayton, OH (US);
Abstract
A method of improving image resolution by interpolation combines the concept of convolution with a parameter-controlled mask, with the concept of adjustment of the mask based on edge information. In the method, first the edge information is extracted from the original image data, and then interpolated to the size to which the original image data will be interpolated. With the guidance of the interpolated edge information, the interpolation process will produce an image with high contrast but minimal artifacts. A spline-under-tension function is applied to generate interpolated values, the function being modified for image data points located close to edges.
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