The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 1992
Filed:
Mar. 25, 1991
Yukio Okamoto, Sagamihara, JP;
Takashi Iino, Katsuta, JP;
Satoshi Shimura, Kokubunji, JP;
Masamichi Tsukada, Minori, JP;
Hiromi Yamashita, Katsuta, JP;
Masatoshi Kitagawa, Mito, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A plasma analyzer for trace element analysis has a gas supply system comprising a plurality of gas sources, an electromagnetic valve provided on a line connecting each gas source to a plasma generating space, a buffer tank provided after the electromagnetic valve on the line, and a flow regulating flowmeter provided after the buffer tank on the line. Each electromagnetic valves is controlled for on-off operation and the corresponding buffer tank suppresses the sudden change of the flow rate of the corresponding gas, so that the composition of the gas supplied to the plasma generating space changes gradually in spite of the simple on-off operation of the electromagnetic valves. Thus, the fluctuation and extinction of the plasma attributable to the sudden change of the composition of the gas supplied to the plasma generating space can be effectively prevented.