The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 1992
Filed:
Dec. 14, 1990
Hiroshi Kimura, Northridge, CA (US);
Ricardo C Pastor, Manhattan Beach, CA (US);
Hughes Aircraft Company, Los Angeles, CA (US);
Abstract
Post-growth gas-impregnation of an ionic crystal is provided to achieve a high level of caged neutral diatomic species or charged diatomic species, where all other internal degrees of freedom of the species, except the vibrational, are frozen. In the former case, the neutral diatomic species (molecules) enter interstitially, while in the latter case, the charged diatomic species (anions) substitute for anions on the crystal lattice. Such a system provides an efficient mid-infrared, solid-state laser that can be pumped by a laser diode. Other uses include magnetic (Faraday) rotators, electro-optic switches, and Q-switches. The impregnation process introduces the species into the host lattice at a temperature below the melting point of the host crystal, and preferably at a phase transition of the crystal, followed by slow cooling. A pressure greater than atmospheric pressure is used to introduce the tenant molecule interstitially, while a pressure of at least 1 atmosphere is used to introduce the dopant anion substitutionally.