The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 1992
Filed:
May. 14, 1990
Applicant:
Inventors:
Satiko Okazaki, Tokyo, JP;
Masuhiro Kogoma, Saitama, JP;
Assignee:
Research Development Corporation of Japan, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ; C23C / ;
U.S. Cl.
CPC ...
427 39 ; 427 38 ; 4272556 ; 4272551 ;
Abstract
A process for forming a thin polymeric film is disclosed, which comprises introducing a mixture of an organic monomer gas and helium into a reaction vessel, producing a glow discharge plasma at atmospheric pressure and depositing the plasma on a substrate wherein the helium in the gas mixture is present in an amount higher than 90% by volume.