The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 1992

Filed:

Jun. 17, 1991
Applicant:
Inventors:

Eberhard Krause, Oakville, CA;

Vladimir J Zatka, Oakville, CA;

Steven W Laundry, Burlington, CA;

Assignee:

Inco Limited, Toronto, CA;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01G / ; C01G / ;
U.S. Cl.
CPC ...
423 42 ; 423 27 ; 423 34 ; 423 47 ; 423602 ; 423604 ;
Abstract

The invention provides a method of forming copper arsenate. Copper and arsenic are leached into a treatment solution maintained at a pH level of about 2 to 5 in the presence of at least one impurity. An oxidant is added to the treatment solution to oxidize the copper and arsenic. A copper arsenate compound is precipitated from the solution as copper arsenate. Preferably, the copper arsenate is then releached in a purification solution. The molar ratio of copper to arsenic is adjusted to a level of at least 2. The pH of the purification solution is then increased to precipitate copper arsenate having a decreased concentration of said at least one impurity. Impure copper arsenate may be suspended and reacted in a recrystallization solution preferably having cupric ion. The pH of recrystallization solution is adjusted to a valve between about 1 and 4.5.


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