The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 1992
Filed:
Feb. 07, 1991
Applicant:
Inventors:
Tsutomu Takahasi, Kawasaki, JP;
Takeshi Suyama, Kawasaki, JP;
Satoshi Suzuki, Yokohama, JP;
Isao Abe, Kawasaki, JP;
Akihiro Sueda, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
357 234 ; 357 238 ; 357 42 ; 357 53 ; 357 55 ;
Abstract
A P-well region is provided in a semiconductor substrate of N-type. A P-channel MOSFET is arranged in the N-type substrate while an N-channel MOSFET is arranged in the P-well region. The drain regions of the respective MOSFETs consist of high concentration impurity diffused regions and low concentration impurity diffused regions arranged about the respective high concentration impurity diffused regions. Also, a drain electrode is provided to cover the entire of the high and low concentration impurity diffused regions.