The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 1992
Filed:
May. 20, 1991
Yoichi Hashimoto, Kenkyusho, JP;
Masami Inoue, Kenkyusho, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
An X-ray mirror having its layer structure in the sequence of: a substrate having the surface roughness (R.sub.max) of 1,000 .ANG. or below; an intermediate layer of high molecular weight material formed on this substrate and having a surface roughness (R.sub.max) of 100 .ANG. or below; and a thin film formed on this intermediate layer, the X-ray mirror being produced by the process steps of: providing a substrate having a surface roughness (R.sub.max) of 1,000 .ANG. or below; forming on this substrate an intermediate layer of a high molecular weight material by spin-coating with a surface roughness (R.sub.max) of 100 .ANG. or below; and finally forming a thin film on this intermediate layer.