The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 1992

Filed:

Dec. 11, 1990
Applicant:
Inventors:

Im J Rangwalla, N. Andover, MA (US);

Sam Nablo, Lexington, MA (US);

Assignee:

Energy Sciences, Inc., Wilmington, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2504923 ; 250398 ;
Abstract

Through the use of a hybrid or the combination of inexpensive relatively impure, and expensive pure, nitrogen purging at various locations of electron-beam processing of polymer and other coatings, high speed efficient processing can be obtained at reduced cost.


Find Patent Forward Citations

Rangwalla, Im. (1992). Method of and apparatus for improved nitrogen inerting of surfaces to be (U.S. Patent No. 5120972). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5120972

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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