The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 1992
Filed:
Feb. 05, 1990
Applicant:
Inventor:
Michael J Hanrahan, Rochester, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-7 ; 430321 ; 430322 ; 430325 ; 430326 ; 430329 ;
Abstract
A lithographic lift-off process includes coating a layer of positive resist material using a dynamic dispense on top of a preexisting layer of a different positive resist material. Thereafter, patternwise exposing both layers simultaneously and developing the exposed portions of both layers for a sufficient time to provide openings in the resists wherein the dynamic dispense layer overhangs the preexisting layer.
Hanrahan, Michael. (1992). Lift-off process for patterning dichroic filters (U.S. Patent No. 5120622). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5120622
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile