The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 1992
Filed:
Oct. 11, 1990
Ravinder Prakash, Concord, NC (US);
Larry L Wolfe, Broomfield, CO (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An exposure system for electrophotographic apparatus having an aperture plate for masking one or more laser beams. The plate contains one or more apertures which have irregular edges to form a gaussian light distribution for the light beams passing through the apertures. A saw-toothed edge is used with a predetermined amplitude ratio to predictably attenuate the light at the edges which correspond to the process or in-track direction in the exposed image. The gaussian distribution is more tolerable of spacing changes in scan lines and improves the continuity of process direction lines in the finished image.