The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 1992

Filed:

Feb. 28, 1991
Applicant:
Inventors:

Alan L Wertheimer, Pittsford, NY (US);

Thomas W Dey, Springwater, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
2502 / ; 2502019 ; 356121 ;
Abstract

A novel composite imaging mask suitable for employment in a method for simultaneously determining coarse and fine petal piston in a segmented imaging assembly. The mask comprises a transparent substrate comprising two spaced-apart apertures, which apertures are dedicated to coarse petal alignment; a first overlay deposited on a face of the substrate, for defining four phase retardation regions dedicated to fine petal alignment; a second overlay comprising an opaque coating, the second overlay deposited on the face of the substrate and complementary to the four phase retardation regions and the apertures, and a means for spirally separating the coarse and fine alignment entities.


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