The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 1992
Filed:
Jul. 03, 1989
Amarjit S Brar, Edina, MN (US);
Jagdish P Sharma, Bloomington, MN (US);
Magnetic Peripherals Inc., Minneapolis, MN (US);
Abstract
An etching and fluorinating treatment is disclosed for modifying the surface properties of magnetic data storage media and sliders for magnetic data transducing heads. Media enclosed within a plasma chamber is first exposed to an argon plasma for cleaning, then exposed to a plasma mixture including argon with either fluorine or carbon tetrafluoride, maintained at a pressure of approximately half of atmospheric pressure, at a temperature of about 100.degree. C. An electrical field is generated for forming argon, carbon and fluorine ions. The argon ions etch the carbon overcoat of the disc, while the carbon and fluorine ions combine with the carbon to form extended chain fluoropolymers, and also penetrate the carbon layer. Sliders are treated in a plasma mixture of argon and CF.sub.4. During such treatment, carbon and fluorine ions penetrate exposed surface areas of the slider, and form a reaction product of solid lubricant film. In connection with both processes, ion penetration and reaction product formation reduce surface energy and strengthen cohesive bonding. The formation of a solid lubricant of extended chain fluoropolymers improves lubricity.