The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 1992

Filed:

Jun. 22, 1990
Applicant:
Inventors:

Donald W Mallik, North Tarrytown, NY (US);

Salvatore F D'Amato, Floral Park, NY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D / ; B29D / ;
U.S. Cl.
CPC ...
264-13 ; 264-14 ; 264-16 ; 264-17 ; 264106 ; 427 44 ; 427162 ; 427163 ; 427258 ;
Abstract

A method and system for replicating microstructures surface relief patterns, such as diffraction patterns including holograms, by casting. A liquid casting resin is held between a surface relief master of the microstructure to be replicated and a substrate while the resin is hardened by actinic radiation curing. Application of resin to edges and discontinuities of the master is avoided in order to reduce undesirable build-up of resin on these areas of the master. The hardened resin surface relief replica may optionally be coated with a discontinuous graphical pattern of a clear or colored paint that eliminates the effect of the surface relief pattern in the regions so coated.


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