The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 1992
Filed:
Dec. 07, 1990
Applicant:
Inventors:
David J Edell, Lexington, MA (US);
Lloyd D Clark, Jr, Portsmouth, VA (US);
Assignee:
Massachusetts Institute of Technology, Cambridge, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K / ;
U.S. Cl.
CPC ...
156647 ; 1566571 ; 156656 ; 156657 ; 252 795 ;
Abstract
An aqueous solution of cesium hydroxide serves as a highly selective anisotropic etch for semiconductor crystals including silicon. The cesium hydroxide also has a high etch selectivity for tantalum with respect to semiconductor crystals.