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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 5115456 B1

PDFFull Text
Date of Patent:
May. 19, 1992

Filed:

Dec. 08, 1989

Mask for exposing wafer with radiation and its exposing method

Applicant:
Inventors:

Takeshi Kimura, Higashimurayama, JP;

Shinji Kuniyoshi, Tokyo, JP;

Akihiko Kishimoto, Tachikawa, JP;

Takashi Soga, Hachioji, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:

Antonelli, Terry, Stout & Kraus

Primary Examiner:

Janice A Howell

Assistant Examiner:

Don Wong

Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 35 ; 378 34 ;
Abstract

A mask for exposing a wafer with radiation and its exposition method in which the radiation exposure mask is provided with at least two radiation exposure windows which each include a mask pattern of a smaller pattern area obtained by dividing a pattern area constituting an integrating circuit chip into a plurality of the areas, and a semiconductor wafer is exposed with radiation while the radiation exposure mask is intermittently moved by a distance of the size of the small pattern area.

Find Patent Forward Citations

Kimura, Takeshi. (1992). Mask for exposing wafer with radiation and its exposing method (U.S. Patent No. 5115456). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5115456

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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