The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 1992
Filed:
Dec. 27, 1989
Menahem Kraus, Ann Arbor, MI (US);
Diosie Velazquez, Saline, MI (US);
Chan-Hong Wang, Ann Arbor, MI (US);
Gelman Sciences, Inc., Ann Arbor, MI (US);
Abstract
A process for preparing charge modified filtration media including the steps of forming a filtration microporous or macroporous membranous or nonmembranous medium structure having internal and external surfaces and including a quaternizable nitrogen containing polymer exposed at the internal and external surfaces, permanently charging the exposed quaternizable nitrogen, and rendering the polymer insoluble in solution and permanently adhered within the filtration medium structure. Charge modified filtration media including a filtration medium structure as described having internal and external surfaces, characterized by a quaternizable nitrogen containing polymer exposed at the internal and external surfaces and having permanently charged quaternizable nitrogen. The quaternized nitrogen containing polymer is insoluble in solution and permanently adhered within the filtration medium structure.