The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 1992
Filed:
May. 02, 1990
Thomas M Remec, Des Plaines, IL (US);
Zenith Electronics Corporation, Glenview, IL (US);
Abstract
A system and method for ultrasonic cleaning of an in-process shadow mask contaminated with polymeric films such as are employed in color cathode ray tube (CRTs) screen production. The ultrasonic bath contains a solution having a chemically active agent for degrading and removing a targeted cross-linked polymer film contaminant from the shadow mask. The cleaning solution may also have more conventional materials in addition to the chemically active agent. The chemically active agent, attacks PVA films contaminating the mask, may be hydrogen peroxide or a periodate. The agents act to chemically degrade the polymeric contaminants. Contaminants are thus removed from the shadow mask during CRT production to reduce clogging of shadow mask apertures and facilitate attachment of the shadow mask to a faceplate-mounted support structure. The very low concentrations of chemically active agents required in conjunction with ultrasonic energy allows for direct solution-to-transducer contact while providing good mask decontamination.