The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 1992

Filed:

Apr. 05, 1989
Applicant:
Inventors:

Akira Maeda, Gardena, CA (US);

Takashi Kasama, Yokohama, JP;

Tetsuo Yokoyama, Tokyo, JP;

Hiroshi Nishimura, Kashiwa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B / ;
U.S. Cl.
CPC ...
1286532 ; 324307 ; 324309 ;
Abstract

In one aspect of correcting phase distortion in an MR imaging system at high speed and with high precision, partial regions having any shapes are established on a complex image reconstruction, linear phase distortion is estimated for every partial region and the phase distortion of the whole image is corrected by use of the estimated phase distortion. In another aspect, a plurality of phase distortion patterns are measured in advance through phantom imaging and stored. The phase distortion pattern is invariable and hence it is not necessary to perform the measurement for each impage processed. Phase distortion included in data acquired through imaging is corrected by representing it as a summation of the plurality of phase distortion patterns with weighting factors.


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