The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 1992
Filed:
Sep. 27, 1991
Syd R Wilson, Phoenix, AZ (US);
Han-Bin K Liang, Mesa, AZ (US);
Thomas Zirkle, Phoenix, AZ (US);
Yee-Chaung See, Phoenix, AZ (US);
Motorola, Inc., Schaumburg, IL (US);
Abstract
A method of fabricating a trench structure includes providing a substrate having a first layer disposed on a surface thereof and a second layer disposed on the first layer. A trench is formed through the first and second layers and into the substrate. A dielectric liner is formed on the sidewalls of the trench which is then filled with a trench fill material. Portions of the trench liner disposed above the trench fill material are removed and a conformal layer is then formed on the trench structure. The conformal layer and a portion of the trench fill material are then oxidized.