The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 1992

Filed:

Feb. 22, 1990
Applicant:
Inventors:

Masatoshi Nakayama, Saku, JP;

Kunihiro Ueda, Saku, JP;

Toshihiko Ishida, Komoro, JP;

Hiroshi Tanabe, Saku, JP;

Assignee:

TDK Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C / ;
U.S. Cl.
CPC ...
249115 ; 2491141 ; 249141 ; 264338 ; 425810 ; 425812 ; 427135 ;
Abstract

A mold including a cavity the inner surface of which is at least partly coated with a layer selected from a diamond-like film and layers of fluorine and fluorine compounds. The mold is manufactured by a method which comprises placing at least a part of the mold which constitutes the surface portion of the mold cavity in a vacuum film-forming chamber, introducing a hydrocarbon gas into the chamber, ionizing the gas, and then evaporating it onto a desired surface portion of the mold, thus forming a diamond-like film over the mold portion. The mold portion is surface-treated by ionizing a low-molecular-weight fluorine compound into a plasma, forming a fluorine polymer film from the plasma on at least a part of the cavity surface, while applying a bias voltage to the plasma.


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