The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 1992

Filed:

Jan. 09, 1991
Applicant:
Inventors:

Naoto Shigenaka, Hitachi, JP;

Tsuneyuki Hashimoto, Hitachi, JP;

Motomasa Fuse, Katsuta, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
250306 ; 250309 ; 250310 ;
Abstract

An apparatus of material surface observation related to the present invention is a scanning electron microscope which is combined with an accelerator of charged particles. The material surface is activated by irradiation of the charged particles and a surface reaction is induced. Secondary electron in generated by irradiation of the scanning electron beam depending on a shape of the material surface. The secondary electron generated by the irradiation of the scanning electron beam is discriminated from the secondary electrode generated by the irradiation of the charged particles, and only a signal of the secondary electron generated by the irradiation of the scanning electron beam is visualized. Consequently, a reaction process of the material surface which is activated or is reaction-induced by the irradiation of the charged particles can be observed in atomic level with less noise.


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