The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 1992
Filed:
Dec. 14, 1990
Emmanuel Balanzat, Caen, FR;
C Boiziau, Massy, FR;
Charles Darnez, Cauderan, FR;
Jean-Paul Duraud, Ivry /Seine, FR;
Alain LeMoel, Chaville, FR;
Commissariat a l'Energie Atomique, Paris, FR;
Abstract
The invention relates to the production of films having in their thickness at least two superimposed zones, including a semimetallic zone and an electrically insulating zone, by irradiating a polymer film by means of a high energy ion beam. It is possible by this process to produce semimetal (1)/insulant (2)/semimetal (3) structures by irradiating the polymer under vacuum by means of light ions or with a limited stopping power having an energy of at least 1 MeV/amu. It is also possible to obtain insulant (4)/semimetal (5)/insulant (6) structures by irradiating, in a confined atmosphere, the polymer by means of heavy ions or ions having a high energy loss with an energy of at least 1 MeV/amu. By irradiating only certain zones of the film, it is thus possible to form embedded or surface-positioned electrical connections.