The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 1992

Filed:

Feb. 20, 1991
Applicant:
Inventors:

Tetsuo Ono, Kokubunji, JP;

Susumu Hiraoka, Kokubunji, JP;

Keizo Suzuki, Kodaira, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B44C / ; C23F / ;
U.S. Cl.
CPC ...
156643 ; 118730 ; 118 501 ; 118620 ; 156646 ; 156656 ; 156657 ; 1566591 ; 156662 ; 156345 ; 20419237 ; 20429836 ; 427 38 ;
Abstract

Anisotropic etching can be obtained in the direction of the incident heated beam of reactive gas with the introduction of a second material for controlling reactivity.

Published as:
DE4104762A1; JPH03257182A; US5110407A;

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