The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 1992

Filed:

Feb. 01, 1990
Applicant:
Inventor:

Kenji Tateiwa, Osaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437200 ; 437201 ; 437247 ; 148D / ; 148D / ;
Abstract

A method for fabricating a semiconductive device is described, wherein a semiconductive substrate having a thermally shrinkable, refractory metal silicide thin film is provided, on which an insulating film on the metal silicide thin film is formed. The metal silicide thin film is thermally treated in an atmosphere containing hydrogen. By this, no morphological degradation is observed in the silicide thin film without an increase of the resistance.


Find Patent Forward Citations

Loading…