The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 1992
Filed:
Jan. 23, 1991
Siegfried Chszaniecki, Hanover, DE;
Hermann Berstorff Maschinenbau GmbH, Hanover, DE;
Abstract
A multi-shaft thin-layer reactor for treating fluid materials in which gaseous material is present during such treatment. The treatment involves the addition of gas to the fluid material or the removal of gas therefrom. The reactor includes a housing in which a plurality of axis-parallel conveying shafts are disposed. The housing is cylindrical and the shafts are disposed around the inner periphery thereof in such a manner that each shaft meshes with the two shafts adjacent thereto. The meshing shafts jointly define the outer periphery of a treatment chamber within the housing. At least one sun-and-planet roller extrusion assembly rotates the shafts and is adjacent at least one end of the shafts in a form-locking manner. The conveying shafts also scrape against the internal wall of the housing so that thin layers of the fluid materials fed into the reactor are formed and these thin layers become disposed on the conveyor shafts. Since the treatment chamber is connected to a vacuum source or to a source of gas, the material is readily gassed or degassed as desired. The material itself seals the treatment chamber.