The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 1992
Filed:
Oct. 16, 1987
Stephen L Trokel, New York, NY (US);
Visx, Incorporated, Sunnyvale, CA (US);
Abstract
An argon-flouride excimer laser or other laser source capable of generating far-ultraviolet radiation at 193 nm is pulsed with energy densities of greater than 20 mj per cm.sup.2 at a repetition rate up to 25 pulses per second to direct its radiation through a mask and onto corneal tissue, or other biological matter, to form a groove therein of predetermined configuration and depth by a process of ablative photodecomposition. The masks are formed with a slit, circular, crescent or other openings of widths between 30 and 800 microns, and may even be formed to provide a graded intensity center to edge. The mask is reflective or composed of or faced with an organic polymer to prevent heat build-up. Each micron of the depth of a 200 micron deep groove formed in corneal tissue, for example, resulted from the application of 1 joule per square centimeter of radiation, from a series of pulses delivered at intensities of between 100 mj and 200 mj per square centimeter and at a laser pulse rate of between 1 and 25 Hertz; the entire groove taking 100 seconds.