The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 1992

Filed:

Mar. 25, 1991
Applicant:
Inventors:

Heikki J Sipila, Espoo, FI;

Marja-Leena Jarvinen, Helsinki, FI;

Jouko A Koskinen, Helsinki, FI;

Assignee:

Outokumpu Oy, Helsinki, FI;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
378 46 ; 378 47 ;
Abstract

Analyzing sludgy materials by exposing the flowing material in continuous action to x-ray radiation and by measuring the radiation thus created in the said material, according to the invention, the radiation emitted from the material is measured with respect to the intensities of both x-ray fluorescence radiation and x-ray diffraction radiation, and these intensities are combined in order to form a parameter which describes the proportions of the partial components in a given compound combination. Moreover, the detectors employed in the measurement of the radiation intensities are placed at the same cross-sectional plane of the analyzer.


Find Patent Forward Citations

Sipila, Heikki. (1992). Method and apparatus for analyzing sludgy materials (U.S. Patent No. 5107527). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5107527

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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