The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 1992
Filed:
May. 04, 1990
Shih-Ger Chang, El Cerrito, CA (US);
David K Liu, San Pablo, CA (US);
The Regents of the University of California, Alameda, CA (US);
Abstract
Exhaust gases are treated to remove NO or NO.sub.x and SO.sub.2 by contacting the gases with an aqueous emulsion or suspension of yellow phosphorous preferably in a wet scrubber. The addition of yellow phosphorous in the system induces the production of O.sub.3 which subsequently oxidizes NO to NO.sub.2. The resulting NO.sub.2 dissolves readily and can be reduced to form ammonium ions by dissolved SO.sub.2 under appropriate conditions. In a 20 acfm system, yellow phosphorous is oxidized to yield P.sub.2 O.sub.5 which picks up water to form H.sub.3 PO.sub.4 mists and can be collected as a valuable product. The pressure is not critical, and ambient pressures are used. Hot water temperatures are best, but economics suggest about 50.degree. C. The amount of yellow phosphorus used will vary with the composition of the exhaust gas, less than 3% for small concentrations of NO, and 10% or higher for concentrations above say 1000 ppm. Similarly, the pH will vary with the composition being treated, and it is adjusted with a suitable alkali. For mixtures of NO.sub.x and SO.sub.2, alkalis that are used for flue gas desulfurization are preferred. With this process, better than 90% of SO.sub.2 and NO in simulated flue gas can be removed. Stoichiometric ratios (P/NO) ranging between 0.6 and 1.5 were obtained.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile